E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
A simple high-temperature zone-fusion apparatus based on an elliptical mirror cavity and a 1 kW halogen lamp in one focus is described. Zone fusion is achieved by passing a ceramic rod through the second focus along the optical axis of the cavity by means of an excentrical sample holder. The apparatus has been used for single-crystal growth of refractory oxides and their solid solutions with melting temperatures up to 2100°C. © 1984.
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
T.N. Morgan
Semiconductor Science and Technology
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997