Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
We produce an analytic family of finite-dimensional Lie algebras, parameterized by a smooth Hausdorff manifold, which does not correspond to the Lie algebra of any Hausdorff (separable) family of Lie groups. This answers a question of Douady and Lazard. © 1977 American Mathematical Society.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007
Simeon Furrer, Dirk Dahlhaus
ISIT 2005
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007