Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In this article, we present a family of algorithms for linear programming based on an algorithm proposed by von Neumann. The von Neumann algorithm is very attractive due to its simplicity, but is not practical for solving most linear programs to optimality due to its slow convergence. Our algorithms were developed with the objective of improving the practical convergence of the von Neumann algorithm while maintaining its attractive features. We present results from computational experiments on a set of linear programming problems that show significant improvements over the von Neumann algorithm.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
Shashanka Ubaru, Lior Horesh, et al.
Journal of Biomedical Informatics