Modeling polarization for Hyper-NA lithography tools and masks
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SPIE Advanced Lithography 2007
This paper presents a measurement framework for evaluating model-based test generation (MBTG) tools. The proposed framework is derived by using the Goal Question Metric methodology, which helps formulate the metrics of interest: complexity, ease of learning, effectiveness, efficiency, and scalability. We demonstrate the steps involved in evaluating MBTG tools by describing a case study designed for this purpose. This case study involves the use of four MBTG tools that differ in their modeling techniques, test specification techniques, and test generation algorithms. © 2006 IBM.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - The International Society for Optical Engineering
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CASCON 2024