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Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Let G be a triangle‐free graph on n points with m edges and vertex degrees d1, d2,…, dn. Let k be the maximum number of edges in a bipartite subgraph of G. In this note we show that k ⩾ m/2 + Σ ni=1 √di. It follows as a corollary that k ⩾ m/2 + cm3/4. Copyright © 1992 Wiley Periodicals, Inc., A Wiley Company
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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SPIE Optical Science, Engineering, and Instrumentation 1998
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