Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
We propose a modified discretization for the current continuity equation in the hydromodel for semiconductors. It combines ease of implementation within existing codes and robustness, even for extremely short devices. Some computational results for one and two dimensional structures are given. © 1991, MCB UP Limited
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
M. Tismenetsky
International Journal of Computer Mathematics
Y.Y. Li, K.S. Leung, et al.
J Combin Optim