Characterization of line width variation
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
The running solutions and I-V characteristic of an extended Josephson junction in a state near the ohmic regime are calculated by a perturbation method. Both the voltage-driven and current-driven cases are considered and the convergence of the perturbation procedure is proved. An integral representation of the first correction, in the I-V curve, to the ohmic regime-as well as its dependence on the external magnetic field-is given and evaluated numerically for various values of the junction parameters. © 1979.
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
M. Shub, B. Weiss
Ergodic Theory and Dynamical Systems