Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This note shows how a standard result about linear inequality systems can be used to give a simple proof of the fact that the range of a nonatomic vector measure is convex, a result that is due to Liapounoff. © 1994.
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Photomask and Next-Generation Lithography Mask Technology 2004
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ICLR 2023
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