Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Paper
Action of far-ultraviolet radiation (185 nm) on poly(ethylene terephthalate) films: a method for controlled dry-etching
Abstract
Far-ultraviolet light (185 nm) rapidly etches poly(ethylene terephthalate) films without any subsequent processing. Both non-oxidative and oxidative mechanisms are operative. © 1982.
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