Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Statistical experiments have been performed on the photostore to test its reliability as a mass storage system. Errors are analyzed with respect to rate, distribution, and susceptibility to correction by several codes. The experimental results reported are based on disks recorded by optical techniques. Experimental results on disks recorded with electron beams win be reported separately. Copyright © 1968 by The Institute of Electrical and Electronic Engineering, Inc.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Apostol Natsev, Alexander Haubold, et al.
MMSP 2007
Marshall W. Bern, Howard J. Karloff, et al.
Theoretical Computer Science