Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper is concerned with the statistical analysis of first-order linear distributed-parameter systems with random parameters and random inputs. In both cases, Gaussian processes are assumed. This work essentially extends the statistical theory available for analyzing random linear lumped-parameter systems to a restricted class of distributed-parameter systems. © 1963.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Zhengxin Zhang, Ziv Goldfeld, et al.
Foundations of Computational Mathematics
J. LaRue, C. Ting
Proceedings of SPIE 1989
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991