Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
An analytical approximation is found for Γ0, the TE0 radiation confinement factor in symmetric heterostructures, by using a combination of its asymptotes in the limits of very thin active layers and thick active layers, respectively. The exact expression for Γ0 is calculated and compared to the approximation formula, It is found that for any light guiding planar double heterostructure (DH) configuration the approximation is at most −1.5 percent off with respect to the exact Γ0 value. © 1978 IEEE
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
K.N. Tu
Materials Science and Engineering: A
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films