Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Revanth Kodoru, Atanu Saha, et al.
arXiv
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals