H.D. Dulman, R.H. Pantell, et al.
Physical Review B
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Ming L. Yu
Physical Review B
Hiroshi Ito, Reinhold Schwalm
JES
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering