Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
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SPIE Advanced Lithography 2007
An automatic LHe transfer system for use with small (∼50 l) research dewars is described. The system is simple and is designed to be safe and reliable. © 1983.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Journal of Applied Mechanics, Transactions ASME
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