Lawrence Suchow, Norman R. Stemple
JES
Recent progress in continuing CMOS scaling is accomplished by introducing new device structures and new materials. This paper reviews recent progress in new technology features for silicon CMOS. With the imminent perceived "end" of CMOS device scaling, there is renewed interest in other non-silicon-FET based device and system architectures. We will discuss the merits of various proposed devices and fabrication techniques and suggest areas for further study. © 2005 Published by Elsevier Ltd.
Lawrence Suchow, Norman R. Stemple
JES
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
Mark W. Dowley
Solid State Communications
Ellen J. Yoffa, David Adler
Physical Review B