Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
ESD robustness of 4 kV HBM is achieved in CMOS-on-SOI ESD protection networks in an advanced sub-0.25 μm mainstream CMOS-on-SOI technology. Design layout, body contact, floating-gate effects and novel ESD protection implementations are discussed. © 1998 Elsevier Science B.V.
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
M.A. Lutz, R.M. Feenstra, et al.
Surface Science