C.Y. Wong, F.S. Lai, et al.
Journal of Applied Physics
The effect of the mechanical constraints exerted by coatings upon electromigration in thin films is evaluated on the basis of known pressure effects upon diffusion. © 1972 The American Institute of Physics.
C.Y. Wong, F.S. Lai, et al.
Journal of Applied Physics
O.C. Wells, E. Munro, et al.
Institute of Physics Electron Microscopy and Analysis Group Conference 1991
F.M. D'Heurle
MRS Fall Meeting 1995
F.M. D'Heurle, O. Thomas
Defect and Diffusion Forum