William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
In this paper we describe a novel method of eliminating charging during the high resolution SEM inspection and dimensional measurements of x-ray and optical masks. A soluble conducting polymer, polyaniline, is spin-coated on the mask and found to prevent charging even at 15 KV. This method is a non-destructive process in contrast to the commonly used technique of metal deposition, since the polymer can be cleanly removed without any damage to the mask. © 1991.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
J. Tersoff
Applied Surface Science
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures