Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this paper we describe a novel method of eliminating charging during the high resolution SEM inspection and dimensional measurements of x-ray and optical masks. A soluble conducting polymer, polyaniline, is spin-coated on the mask and found to prevent charging even at 15 KV. This method is a non-destructive process in contrast to the commonly used technique of metal deposition, since the polymer can be cleanly removed without any damage to the mask. © 1991.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
T. Schneider, E. Stoll
Physical Review B
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules