William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
The surface core-level binding energy shifts have been obtained for the In 4d and the P2p core-levels on the InP(110) surface. In agreement with previous studies of core-level shifts on the cleavage face of III-V semiconductors, the anion and cation shifts are of almost equal magnitude and are of opposite polarity (-0.31 and +0.30 eV respectively). The results are compared with a similar investigation of the GaAs(110) surface and discussed in terms of a recent calculation of surface core-level shifts for the (110) cleavage face of III-V semiconductors. © 1989.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
J.A. Barker, D. Henderson, et al.
Molecular Physics
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Revanth Kodoru, Atanu Saha, et al.
arXiv