Philip E. Batson
Microscopy and Microanalysis
A method is described to find the optimal fourth order setup of a quadrupole-octupole third-order aberration corrector. Given accurate measurements of aberrations to fifth order, stimulus/response experiments can be used to synthesize pure controls for each measured aberration up to fourth order, including those which are caused by parasitic effects - symmetry violations, misalignments, construction mistakes, post-construction drift or other problems.
Philip E. Batson
Microscopy and Microanalysis
Philip E. Batson
Journal of Electron Microscopy
Marek A. Turowski, Thomas F. Kelly, et al.
Journal of Applied Physics
Alejandro Reyes-Coronado, Rubén G. Barrera, et al.
Physical Review B - CMMP