Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
For high integrity cryptographic systems, the control mechanisms are already available as exemplified by the IBM symmetric and asymmetric control vector approaches. These have been designed for effective extension. Such mechanisms are always inevitably in conflict with existing standards which have not sought to define control over key usage. It would be of considerable value to the community as a whole if a consolidated and effective mechanism were to be standardized in the future. © 1995.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Xiaozhu Kang, Hui Zhang, et al.
ICWS 2008
Ziyang Liu, Sivaramakrishnan Natarajan, et al.
VLDB
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009