Simone Raoux, Robert M. Shelby, et al.
Microelectronic Engineering
The crystallization of amorphous Ge2Sb2Te5 (GST) doped with nitrogen is studied with pulsed laser heating. The crystallization time of sputter-deposited films is increased by doping by as much as 100× for nitrogen concentrations of the order of 12 at. % in as-deposited amorphous films. Suppression of the formation of critical crystal nuclei is found to be responsible. The crystallization of melt-quenched amorphous material is also slowed by doping but less dramatically. © 2009 American Institute of Physics.
Simone Raoux, Robert M. Shelby, et al.
Microelectronic Engineering
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