Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Review
Designing a new form factor for wearable computing
Abstract
No abstract available.
Related
Kaoutar El Maghraoui, Gokul Kandiraju, et al.
WOSP/SIPEW 2010
Limin Hu
IEEE/ACM Transactions on Networking
Paper
The Qx-coder
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev