Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The complex reaction path of the dissociative chemisorption of Sb4 on Si(001) involving four distinct types of precursor states is determined using a direct tracking method with scanning tunneling microscopy. The energy barriers and the prefactors for the transitions between different states are measured by analyzing the population distribution of Sb clusters as a function of thermal treatment. These precursors are found not to have thermal mobility before dissociation, contrary to the widely held notion about precursor states. © 1993 The American Physical Society.
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
K.N. Tu
Materials Science and Engineering: A
R. Ghez, M.B. Small
JES