Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We find the distribution that has maximum entropy conditional on having specified values of its first rL -moments. This condition is equivalent to specifying the expected values of the order statistics of a sample of size r. The maximum-entropy distribution has a density-quantile function, the reciprocal of the derivative of the quantile function, that is a polynomial of degree r; the quantile function of the distribution can then be found by integration. This class of maximum-entropy distributions includes the uniform, exponential and logistic, and two new generalizations of the logistic distribution. It provides a new method of nonparametric fitting of a distribution to a data sample. We also derive maximum-entropy distributions subject to constraints on expected values of linear combinations of order statistics. © 2007 Elsevier B.V. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Fausto Bernardini, Holly Rushmeier
Proceedings of SPIE - The International Society for Optical Engineering
George Markowsky
J. Math. Anal. Appl.
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI