Conference paper
Surface processes in plasma-assisted etching
J.W. Coburn
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
Related
Conference paper
Role of ions in reactive ion etching
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
J.W. Coburn, H.F. Winters
Nuclear Inst. and Methods in Physics Research, B
J.W. Coburn
Review of Scientific Instruments