Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We study the problem of schema revalidation where XML data known to conform to one schema must be validated with respect to another schema. Such revalidation algorithms have applications in schema evolution, query processing, XML-based programming languages, and other domains. We describe how knowledge of conformance to an XML Schema may be used to determine conformance to another XML Schema efficiently. We examine both the situation where an XML document is modified before it is revalidated and the situation where it is unmodified © 2007 IEEE.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Pradip Bose
VTS 1998
Rolf Clauberg
IBM J. Res. Dev
Daniel M. Bikel, Vittorio Castelli
ACL 2008