William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Paper
Electron-gun Evaporators of Refractory Metals Compatible with Molecular Beam Epitaxy
Abstract
The construction and performance of electrostatic electron gun evaporators, placed in a molecular beam epitaxy system are described. Minimizing electron emittance led to an evaporation of refractory metals at a vacuum level of 2x 10“lo-2X 10 9 Torr. © 1985, American Vacuum Society. All rights reserved.
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