Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
Embedded cluster modeling of excited chromium impurities in halide elpasolites
Abstract
Embedded cluster calculations performed on both ground (4A2g) and excited (4T2g) states of substitutional Cr in halide elpasolites account successfully for the pressure dependence of photoluminescence spectra. © 1991, Taylor & Francis Group, LLC. All rights reserved.
Related
A. Reisman, M. Berkenblit, et al.
JES
Ronald Troutman
Synthetic Metals
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films