Conference paper
Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
The epitaxial growth of silicon on Si(001)-(2x 1) substrates at temperatures between 580 and 850 K is studied using scanning tunneling microscopy (STM). The growth is strongly anisotropic, forming long narrow structures only a few dimers wide but more than 100 A long. Models are proposed for the two types of antiphase boundaries that are observed on the epitaxially grown surfaces. © 1990, American Vacuum Society. All rights reserved.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules