Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Using an algorithm to analyze opportunistically collected mobile phone location data, the authors estimate weekday and weekend travel patterns of a large metropolitan area with high accuracy. © 2011 IEEE.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
S. Sattanathan, N.C. Narendra, et al.
CONTEXT 2005
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
Oliver Bodemer
IBM J. Res. Dev