J. Angilello, J.E.E. Baglin, et al.
Journal of Electronic Materials
The reliability of molten KOH for revealing dislocations intersecting {100} faces of GaAs has been tested using transmission x-ray topography. It is found to be a "faithful" etch.
J. Angilello, J.E.E. Baglin, et al.
Journal of Electronic Materials
T.F. Kuech, E. Veuhoff, et al.
Journal of Crystal Growth
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
T.F. Kuech, R.M. Potemski, et al.
Journal of Electronic Materials