Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
If X is a compact, zero-dimensional group and T is an expansive, transitive automorphism then (X, T) is shown to be topologically conjugate to a full shift on finitely many symbols. The problem of classifying such automorphisms up to simultaneous algebraic isomorphism and topological conjugacy is discussed but not solved. It is proved that for any entropy there are only finitely many such equivalence classes. When the entropy is log p for a prime p, there is only one equivalence class. All are then equivalent to [omitted formula]. © 1987, Foundation for Environmental Conservation. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
George Markowsky
J. Math. Anal. Appl.
Jianke Yang, Robin Walters, et al.
ICML 2023