Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We study the LDMt factorization of banded Toeplitz matrices. We show that, under fairly general conditions, the L, M, and D factors exhibit exponential convergence along diagonals. We also give explicit formulas for the limiting values. Our method of proof involves a generalization to matrices of the theory of continued fractions of quadratic irrationals. © 1995, All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Peter Wendt
Electronic Imaging: Advanced Devices and Systems 1990
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007