Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We study the LDMt factorization of banded Toeplitz matrices. We show that, under fairly general conditions, the L, M, and D factors exhibit exponential convergence along diagonals. We also give explicit formulas for the limiting values. Our method of proof involves a generalization to matrices of the theory of continued fractions of quadratic irrationals. © 1995, All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
John S. Lew
Mathematical Biosciences
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985