Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We study the LDMt factorization of banded Toeplitz matrices. We show that, under fairly general conditions, the L, M, and D factors exhibit exponential convergence along diagonals. We also give explicit formulas for the limiting values. Our method of proof involves a generalization to matrices of the theory of continued fractions of quadratic irrationals. © 1995, All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Shashanka Ubaru, Lior Horesh, et al.
Journal of Biomedical Informatics
Andrew Skumanich
SPIE Optics Quebec 1993
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.