Conference paper
Characterization of line width variation
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
A technique is presented by which NC and RNC algorithms for some problems can be extended into NC and RNC algorithms, respectively, that solve more general parametric problems. The technique is demonstrated on explicit bounded degree circuits. Applications include parametric extensions of the shortest-path and spanning-tree problems and, in particular, the minimum-ratio-cycle problem, showing all these problems are in NC. © 1989 Springer-Verlag New York Inc.
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998