Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A continuous [formula omitted] action on a subshift of finite type consists of a subshift of finite type with its shift transformation, together with a group, G, of homeomorphisms of the subshift and a group automorphism T, so that the commutation relation σ ° g = Tg ° ∑A is any positive entropy subshift of finite type, G is any finite group and T is any automorphism of G then there is a non-trivial [formula omitted] action on ∑A. We then classify all such actions up to ‘almost topological‘ conjugacy. © 1985, Cambridge University Press. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992