Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A self-consistent pseudopotential calculation of the energetics of aluminum growth on Ge(001) in the epitaxial relationship (001) [100] (001)[100]A1(001)[110]Ge is presented. We observe that the equilibrium Al-Ge interplanar distance increases with the overgrowth thickness t and, more significantly, rapidly saturates (t3) to a value equal to the average interplanar distances of the two systems. We also conclude that the Frank-van der Merwe growth sequence of Al would begin at the bridging sites on Ge(001). © 1984 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R. Ghez, J.S. Lew
Journal of Crystal Growth
Michiel Sprik
Journal of Physics Condensed Matter
T. Schneider, E. Stoll
Physical Review B