David J. Smith, Z.G. Li, et al.
Scripta Metallurgica et Materiala
Paper
Growth and structural characterization of highly oriented sputter-deposited (111), (110), and (100) Co/Cu superlattices
Abstract
Highly oriented, sputter-deposited (111), (110), and (100) Co/Cu superlattices have been grown simultaneously on substrates of Al2O3 (sapphire), MgO (110), and (100), respectively, using thin seed layers of Pt or Pd deposited at ∼500 °C. High-resolution electron microscopy and x-ray scattering demonstrate that the films are epitaxial and of excellent crystallinity. © 1997 American Institute of Physics.
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