Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The relational model of data, the XRM Relational Memory System, and the SEQUEL language have been covered in previous papers and are reviewed. SEQUEL is a relational data sublanguage intended for ad hoc interactive problem solving by non-computer specialists. A version of SEQUEL that has been implemented in a prototype interpreter is described. The interpreter is designed to minimize the data accessing operations required to respond to an arbitrary query. The optimization algorithms designed for this purpose are described. © 1975, ACM. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
M.F. Cowlishaw
IBM Systems Journal
Jose Manuel Bernabe' Murcia, Alejandro Molina Zarca, et al.
Computing
Rajeev Gupta, Shourya Roy, et al.
ICAC 2006