Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This study has developed a simple way to produce in-line electron hologram without the need for lenses. This leads to coherent electron beams having very low kinetic energies between 10eV and 300eV. The setup of this low-energy electron point source microscope is shown and discussed together with its light optical equivalent. Distances are scaled according to the wavelength difference of roughly four orders of magnitude between photons and electrons.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Gangulee, F.M. D'Heurle
Thin Solid Films
A. Krol, C.J. Sher, et al.
Surface Science
Michiel Sprik
Journal of Physics Condensed Matter