Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Hot electrons in GaAs in the presence of a highly nonequilibrium plasma generated by a 150-fs laser pulse are shown to have an energy-loss rate to the plasma that is two to four times higher than a hot electron in the presence of a cooler, thermalized plasma of the same density. The increased energy-loss rate due to the nonequilibrium plasma is consistent with the reduced screening that has been predicted for such a plasma. In addition, the linewidth of the hot acceptor luminescence peak, which is used to measure the energy-loss rate, is found to be constant under fs laser excitation as the injected carrier density is increased up to about 2×1016 cm-3. This finding disagrees with a recent prediction. Possible reasons for the disagreement are considered. © 1995 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP