Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We consider the problem of interleaving sequences of positive and negative numbers in order to maximize the minimum, overall prefixes p of the interleaved sequence, of the sum of the numbers in p. A simple and efficient offline solution is given. We also consider an online version of the problem. Under a cost model suitable for the prefetching application that motivates the problem, a strongly competitive online algorithm is given. These problems abstract two practical problems of scheduling data prefetches in a multiprogrammed or multithreaded computing environment.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Guillaume Buthmann, Tomoya Sakai, et al.
ICASSP 2025
M. Tismenetsky
International Journal of Computer Mathematics
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998