Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This issue contains the best papers from the ACM KDD Conference 2016. As is customary at KDD, special issue papers are invited only from the research track. The top-ranked papers from the KDD 2016 conference are included in this issue. This issue contains a total of six articles, which are from different areas of data mining. A brief description of these articles is also provided in this article.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Michael C. McCord, Violetta Cavalli-Sforza
ACL 2007
Beomseok Nam, Henrique Andrade, et al.
ACM/IEEE SC 2006
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009