Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We show that base-stock levels first increase and then decrease as the standard deviation increases for a variety of non-negative random variables with a given mean and provide a distribution-free upper bound for optimal base-stock levels that grows linearly with the standard deviation and then remains constant. © 2007.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
W.F. Cody, H.M. Gladney, et al.
SPIE Medical Imaging 1994
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis