Conference paper
Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Paper
Iteration methods for calculating self-consistent fields in semiconductor inversion layers
Abstract
Two new methods for attaining convergence in self-consistent field calculations are described. They have been applied to semiconductor inversion layers at finite temperature. © 1970.
Related
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Yixiong Chen, Weichuan Fang
Engineering Analysis with Boundary Elements
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence