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SPIE Advanced Lithography 2010
Two new methods for attaining convergence in self-consistent field calculations are described. They have been applied to semiconductor inversion layers at finite temperature. © 1970.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
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ISIT 2005
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IEEE TPAMI
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SPIE OE/LASE 1992