Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Micron-size platinum features are patterned by focusing the output of a CW argon ion Laser (514.5 nm) onto a scanning quartz substrate coated with a spun-on platinum metallo-organic film. The platinum is used as a seed layer for electroless copper plating. The role of laser power, scan speed, and film thickness on the thermal decomposition of the film is discussed. In addition, the electrochemical activity and composition of the platinum features, as well as their use as seed layer for electroless copper plating, is reported. © 1987, The Electrochemical Society, Inc. All rights reserved.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Imran Nasim, Melanie Weber
SCML 2024
R. Ghez, J.S. Lew
Journal of Crystal Growth