Michiel Sprik
Journal of Physics Condensed Matter
Extended x-ray-absorption fine-structure measurements for 0.1, 0.7, and 7 at.% arsenic impurities in single-crystal silicon yield As-to-Si nearest-neighbor distances of 2.41 ± 0.02, which are 0.06 (2.5%) greater than the Si-to-Si distance in pure silicon. Next-nearest-neighbor distances are 3.85 ± 0.02, only 0.01 (0.3%) greater than the corresponding Si-to-Si distance. © 1986 The American Physical Society.
Michiel Sprik
Journal of Physics Condensed Matter
Revanth Kodoru, Atanu Saha, et al.
arXiv
Kigook Song, Robert D. Miller, et al.
Macromolecules
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films