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Modeling polarization for Hyper-NA lithography tools and masks
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Intelligent advisory interfaces will afford new approaches to help and training problems, however little is known about the usability of such facilities. This recent study indicates that although intelligent help can support users, there are also specific potential problems. © 1988, ACM. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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