Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
A proposed theory of liquid electrophotographic development explicitly accounts for the presence of excess ions. The theory shows that the maximum development possible is decreased from the neutralization limit by the ratio of the toner conductivity to the total conductivity. Three independent techniques are proposed to determine this ratio. It is found to be about 0.2 for a commercially available liquid developer.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
David S. Kung
DAC 1998
Daniel M. Bikel, Vittorio Castelli
ACL 2008