S. Ingvarsson, G. Xiao, et al.
Journal of Applied Physics
Magnetoresistance (MR) measurement of unpatterned magnetic tunnel junction wafers was discussed. Current-in-plane tunneling was used. It was found that results are particularly useful for optimizing deposition conditions, nondestructive monitoring and also measures thermal stability.
S. Ingvarsson, G. Xiao, et al.
Journal of Applied Physics
P.L. Trouilloud, B. Petek, et al.
IEEE Transactions on Magnetics
D.C. Worledge, A. Annunziata, et al.
INTERMAG 2015
Jonathan Z. Sun, S.L. Brown, et al.
Physical Review B - CMMP